| 许瑞,刘龙,刘翠翠,徐志刚,彭健,王传彬.Ta/Cr复合涂层的磁控溅射沉积与性能优化[J].装备环境工程,2025,22(1):50-60. XU Rui,LIU Long,LIU Cuicui,XU Zhigang,PENG Jian,WANG Chuanbin.Magnetron Sputtering Deposition and Performance Optimization of Ta/Cr Coatings[J].Equipment Environmental Engineering,2025,22(1):50-60. |
| Ta/Cr复合涂层的磁控溅射沉积与性能优化 |
| Magnetron Sputtering Deposition and Performance Optimization of Ta/Cr Coatings |
| 投稿时间：2024-11-21 修订日期：2025-01-07 |
| DOI：10.7643/issn.1672-9242.2025.01.005 |
| 中文关键词: α-Ta涂层 Cr缓冲层 磁控溅射 力学性能 界面结合 摩擦磨损中图分类号:TG174 文献标志码:A 文章编号:1672-9242(2025)01-0050-11 |
| 英文关键词:α-Tacoating Cr buffer layer magnetron sputtering mechanical properties interface bonding friction and wear |
| 基金项目:广东省基础与应用基础研究重大项目(2021B0301030001) |
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| Author | Institution |
| XU Rui | Branch of Chemistry and Chemical EngineeringGuangdong Laboratory, Guangdong Chaozhou 521000, China |
| LIU Long | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China |
| LIU Cuicui | State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China |
| XU Zhigang | Branch of Chemistry and Chemical EngineeringGuangdong Laboratory, Guangdong Chaozhou 521000, China;State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China |
| PENG Jian | Branch of Chemistry and Chemical EngineeringGuangdong Laboratory, Guangdong Chaozhou 521000, China;State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China |
| WANG Chuanbin | Branch of Chemistry and Chemical EngineeringGuangdong Laboratory, Guangdong Chaozhou 521000, China;State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China |
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| 中文摘要: |
| 目的 在Ta涂层与基体之间引入Cr缓冲层，研究不同Cr缓冲层厚度(447 ~ 1503 nm)对涂层物相结构、微观形貌、力学性能、结合性能及摩擦磨损性能的影响，以提高Ta涂层与不锈钢基体间结合力，提升Ta/Cr复合涂层的性能。方法 采用磁控溅射技术，在PCrNi1MoA合金钢基体上引入Cr缓冲层，构筑Ta/Cr复合涂层。采用X射线衍射仪分析Ta涂层的物相结构，采用扫描电子显微镜观察Ta/Cr复合涂层表面和截面的形貌特征，测量其厚度，观察截面致密度。利用纳米压痕仪测试Ta/Cr复合涂层的力学性能，利用洛氏硬度计和划痕仪测试涂层与基体的结合情况，并利用摩擦磨损仪对材料的耐磨性能进行测试。结果 缓冲层厚度在447~1 283 nm时，可以得到单一物相的α-Ta涂层；缓冲层厚度为1 283 nm时，Ta涂层具有优异的力学性能，硬度达到11.42 GPa，弹性模量为179 GPa，且界面结合力超过30 N，并且表现出优异的摩擦磨损特性，摩擦因数仅0.3~0.4，磨损率低至0.011×10‒6 mm3/(N.m)。结论 Cr缓冲层厚度的变化显著影响Ta/Cr复合涂层的物相结构、晶粒尺寸及表面形貌，进而影响基体与Ta涂层间的结合力以及涂层的力学性能，引入一定厚度的Cr缓冲层有利于制备优异力学和摩擦磨损性能的α-Ta涂层，且与基体结合性能良好。 |
| 英文摘要: |
| The work aims to introduce a Cr buffer layer between the Ta coating and the substrate and study the influence of different Cr buffer layer thickness (ranging from 447 nm to 1503 nm) on the phase structure, microscopic morphology, mechanical properties, bonding properties and friction and wear properties of the coating, so as to enhance the bonding strength between the Ta coating and the stainless steel substrate and improve the performance of the Ta/Cr composite coating. A Cr buffer layer was introduced on the PCrNi1MoA alloy steel substrate according to the magnetron sputtering technology to construct a Ta/Cr composite coating. An X-ray diffractometer was adopted to analyze the phase structure of the Ta coating. A scanning electron microscope was used to observe the morphological characteristics of the surface and crosssection of the Ta/Cr composite coating, and measure its thickness and observe the cross-sectional density. The mechanical properties of Ta/Cr composite coating were tested by nanoindentation instrument, the bonding between coating and substrate was tested by Rockwell hardness tester and scratch meter, and the wear resistance of the material was tested by friction and wear meter.When the thickness of buffer layer was between 447 and 1 283 nm, a single phase α-Ta coating could be obtained.When the buffer layer thickness was 1 283 nm, the Ta coating had excellent mechanical properties, with a hardness reaching 11.42 GPa, an elastic modulus of 179 GPa, and an interface bonding force exceeding 30 N. It also exhibited excellent friction and wear characteristics, with a friction coefficient of only 0.3-0.4 and a wear rate as low as 0.011×10‒6 mm³/N.m. The change in the thickness of the Cr buffer layer significantly affects the phase structure, grain size and surface morphology of the Ta/Cr composite coating, thereby influencing the bonding strength between the substrate and the Ta coating as well as the mechanical properties of the coating. The introduction of a Cr buffer layer with a certain thickness is beneficial to the preparation of α-Ta coating with excellent mechanical and friction and wear properties and good bonding performance with the substrate. |
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