| 刘星辰,李亨特,荆江平,孙萌萌,陈卓元,孙明先,侯健.光电化学阴极保护的原理及研究进展[J].装备环境工程,2017,14(6):1-7. LIU Xing-chen,LI Heng-te,JING Jiang-ping,SUN Meng-meng,CHEN Zhuo-yuan,SUN Ming-xian,HOU Jian.Principle and Research Progress of Photoelectrochemical Cathodic Protection[J].Equipment Environmental Engineering,2017,14(6):1-7. |
| 光电化学阴极保护的原理及研究进展 |
| Principle and Research Progress of Photoelectrochemical Cathodic Protection |
| 投稿时间：2017-04-11 修订日期：2017-06-15 |
| DOI：10.7643/ issn.1672-9242.2017.06.001 |
| 中文关键词: 光电阴极保护技术 光电半导体材料 腐蚀防护 |
| 英文关键词:photoelectrochemical cathodic protection technology photoelectric semiconductor material corrosion protection |
| 基金项目:国家自然科学基金项目（批准号：41576114、41376126）、青岛市创新领军人才项目（批准号：15-10-3-15-(39)-zch）、科技成果转化引导计划（批准号：14-2-4-4-jch） |
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| Author | Institution |
| LIU Xing-chen | 1.Key Laboratory of Marine Corrosion and Bio-fouling, IOCAS, Qingdao 266000, China; 2.State Key Laboratory for Marine Corrosion and Protection, Luoyang Ship Material Research Institute (LSMRI), Qingdao 266101, China |
| LI Heng-te | 1.Key Laboratory of Marine Corrosion and Bio-fouling, IOCAS, Qingdao 266000, China; 2.State Key Laboratory for Marine Corrosion and Protection, Luoyang Ship Material Research Institute (LSMRI), Qingdao 266101, China |
| JING Jiang-ping | 1.Key Laboratory of Marine Corrosion and Bio-fouling, IOCAS, Qingdao 266000, China; 2.State Key Laboratory for Marine Corrosion and Protection, Luoyang Ship Material Research Institute (LSMRI), Qingdao 266101, China |
| SUN Meng-meng | Key Laboratory of Marine Corrosion and Bio-fouling, IOCAS, Qingdao 266000, China |
| CHEN Zhuo-yuan | Key Laboratory of Marine Corrosion and Bio-fouling, IOCAS, Qingdao 266000, China |
| SUN Ming-xian | University of Chinese Academy of Sciences, Beijing 100049, China |
| HOU Jian | University of Chinese Academy of Sciences, Beijing 100049, China |
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| 中文摘要: |
| 简要介绍了光电化学阴极保护技术的基本原理以及其影响因素，总结了历年来该方面的主要研究成果，并简要地介绍了笔者课题组在光电化学阴极保护方面的部分工作。最后，对光电化学阴极保护技术进一步的发展以及应用进行了展望。 |
| 英文摘要: |
| In this paper, the principle of photoelectrochemical cathodic protection technology was introduced briefly. The influencing factors summarized based on the main research reports in this field over years were proposed. Some of the research work of the author group’s were also introduced briefly. Finally, further development and application of photoelectrochemical cathodic protection technology was prospected. |
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