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| Characterization of Microporous on Modified Base of Ni-P Alloy Based on SEM Processing Technique |
| Received:December 30, 2016 Revised:May 15, 2017 |
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| DOI：10.7643/ issn.1672-9242.2017.04.018 |
| KeyWord:electrochemical etching microporous characterization porosity Ni-P Alloy |
| Author | Institution |
| LYU Ji-cheng |
Southwest Technology and Engineering Research Institute, Chongqing , China |
| XU Bin |
Southwest Technology and Engineering Research Institute, Chongqing , China |
| QIAN Jian-cai |
Southwest Technology and Engineering Research Institute, Chongqing , China |
| ZOU Hong-qing |
Southwest Technology and Engineering Research Institute, Chongqing , China |
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| Abstract: |
| Objective to study the quantitative characterization of surface layer pores of Ni-P alloy. Methods Microporous distribution was analyzed by observing SEM microstructure image. The software Image was adopted to treat SEM image and analyze porosity, number of pores, equivalent diameter, etc. on Ni-P alloy surface. Results A microporous layer was prepared on the modified NI-P surface by electrochemical etching. The amount of microporous and the aperture of pores were increased with time. The porosity of microporous after etching for 1min, 3min and 5min was 0.85%, 4.34% and 11.18%. The protection performance of Ni-P alloy was destroyed after etching 5min for. Conclusion After etching for 3min, the microporous of Ni-P layer with the equivalent diameter are distributed uniformly in the range of 100~850 nm. |
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