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| Effect of Microwave Plasma Nitriding Power on the Microstructure and Properties of Ti-N Nitride Layers |
| Received:November 18, 2024 Revised:January 01, 2025 |
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| DOI：10.7643/issn.1672-9242.2025.01.002 |
| KeyWord:titanium Ti-N nitride layer microwave plasma nitriding microstructure mechanical properties tribological properties |
| Author | Institution |
| ZHANG Junhui |
Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Guangdong Chaozhou , China;State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China |
| XU Zhigang |
Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Guangdong Chaozhou , China;State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China ;Hubei Key Laboratory of Advanced Technology for Automotive Components, Wuhan University of Technology, Wuhan , China |
| GAO Peng |
State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China |
| LIU Wenxin |
Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Guangdong Chaozhou , China;State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China |
| LI Jiacheng |
Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Guangdong Chaozhou , China;State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China |
| PENG Jian |
Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Guangdong Chaozhou , China;State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China |
| WANG Chuanbin |
Chaozhou Branch of Chemistry and Chemical Engineering Guangdong Laboratory, Guangdong Chaozhou , China;State Key Lab of Advanced Technology for Materials Synthesis and Processing,, Wuhan , China |
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| Abstract: |
| The work aims to perform microwave plasma nitriding on pure titanium and investigate the effects of microwave plasma nitriding power, as a process parameter, on the microstructure and properties of the nitride layer, so as to enhance the surface hardness of pure titanium and improve its wear resistance. Microwave plasma chemical vapor deposition was employed to nitride the surface of pure titanium under microwave powers of 4 250, 4 500, 4 750, and 5 000 W. X-ray diffraction was used to analyze the phase composition of the nitride layer, and scanning electron microscopy was employed to observe the surface and cross-sectional morphologies of the nitride layer and measure its thickness. The hardness of the nitride layer was evaluated with a Vickers hardness tester and a nano-indentation instrument and the wear resistance was assessed through friction and wear tests. At a lower microwave power of 4 250 W, the plasma concentration and activity were relatively low, leading to the formation of a thin nitride layer containing TiN0.3. As the power increased, the plasma activity and density were enhanced, resulting in a transition of the diffusion mechanism and the formation of a dual-phase structure comprising Ti2N and TiN. This also led to an increase in the thickness of the nitride layer, thereby improving its hardness and wear resistance. The nitride layer prepared at 5 000 W exhibited optimal performance, with a hardness of 22.84 GPa and a friction coefficient of approximately 0.1. Variations in microwave power significantly affected the concentration and activity of the plasma on the substrate surface, thereby affecting the phase composition, structure, and properties of the nitride layer. |
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